Broad ion beam (bib) systems for more efficient processing of multiple samples

ABSTRACT

Systems and methods for operating a broad ion beam (BIB) polisher in a sample preparation workflow having improved uptime, are disclosed. An example method for operating a broad ion beam (BIB) polisher having improved uptime according to the present invention comprises causing a first BIB source to emit a first broad ion beam towards a sample positioned within an interior volume of the BIB polisher while the first BIB source is in emitting the first broad ion beam towards the sample, removing a second BIB source from the BIB polisher that is configured to emit a second broad ion beam towards the sample when in use.

BACKGROUND OF THE INVENTION

Broad Ion Beam (BIB) polishing systems are used to prepare samples forinvestigation. Specifically, BIB polishing systems directing a highenergy, unfocused or minimally focused beams of ions (e.g., Argon ions)at a sample, where the beam degrades and/or otherwise removes theportions of the sample upon which it is incident. Because the broad ionbeam does not require focusing or requires minimal focusing, the BIBpolishing systems do not have the optical column limitations of othersample preparation techniques (such as focused ion beam (FIB) milling),and thus BIB polishing systems can employ much higher primary energybeam currents. Due to the higher primary energy beam currents, BIBsystems are able to more rapidly remove sample material to expose aregion of interest that prior systems, enabling a faster samplepreparation process.

Unfortunately, while highly efficient at removing sample material,samples being processed need to be precisely aligned with special masksthat are designed to block portions of the beam from being incident onregions of the sample that users do not desire to be removed. Becausethis alignment process takes time and requires precise skill, it causesa slowdown in the sample preparation workflow. Additionally, because thehigher current broad ion beam removes sample material more rapidly, therate of redeposition of the removed material onto the broad ion beamsource also increases forcing users to more frequently remove the sourcefor cleaning requiring system downtime. Because of these limitations toworkflow efficiency, the majority of the current use of BIB polishingsystems has been to academic and other non-commercial applications.Therefore, it is desired to have new BIB polishing systems that are ableto efficiently and accurately process many samples in shorter periods oftime.

SUMMARY OF THE INVENTION

Systems and methods for operating a broad ion beam (BIB) polisher in asample preparation workflow having improved uptime, are disclosed. Anexample method for operating a broad ion beam (BIB) polisher havingimproved uptime according to the present invention comprises causing afirst BIB source to emit a first broad ion beam towards a samplepositioned within an interior volume of the BIB polisher while the firstBIB source is in emitting the first broad ion beam towards the sample,removing a second BIB source from the BIB polisher that is configured toemit a second broad ion beam towards the sample when in use. The firstbroad ion beam is configured to cause a portion of the sample upon whichit is incident to be removed. Methods according to the present inventionmay further include sealing off a housing volume containing the secondBIB source from the interior volume before removing the second BIBsource from the BIB polisher, reinstalling the second BIB source (oranother BIB source) in the housing volume, using a pump system to bringat least one of the pressure and gaseous composition of the housingvolume to match that of the interior volume, and switching the valve tothe open state. In this way, the second BIB source can be maintained,cleaned, or replaced while the BIB polisher continues to process samplesusing the first BIB source.

An example broad ion beam (BIB) sample preparation system havingimproved uptime according to the present invention comprises a housingdefining an interior volume, and a sample stage positioned within theinterior volume, wherein the sample stage is configured to hold a sampleholder during polishing of a sample held by the sample holder. Theexample system further comprises a first BIB source configured to emit afirst broad ion beam towards the sample when in use, wherein the firstBIB source is positioned within a first source housing, and a second BIBsource configured to emit a second broad ion beam towards the samplewhen in use, wherein the first BIB source is positioned within a secondsource housing. According to the present invention the second BIB sourceis configured to be removed while the first BIB source is emitting thefirst broad ion beam toward the sample.

BRIEF DESCRIPTION OF THE DRAWINGS

The detailed description is described with reference to the accompanyingfigures. In the figures, the left-most digit(s) of a reference numberidentify the figure in which the reference number first appears. Thesame reference numbers in different figures indicates similar oridentical items.

FIG. 1 depicts a cross section of example BIB systems according to thepresent disclosure that are configured to more efficiently processmultiple samples.

FIG. 2 illustrates of an example environment for more efficientprocessing of multiple samples within a sample preparation workflow.

FIG. 3 depicts an example process for processing samples with a dual BIBsystem enabling increased system uptime, according to the presentinvention.

FIG. 4 depicts an example process for processing samples with a dualmode, optical and BIB milling system for more efficient sampleprocessing, according to the present invention.

FIG. 5 depicts an example process for a processing multiple sampleswithin a dual BIB system with reduced downtime, according to the presentinvention.

FIG. 6 depicts an example process for processing samples with a BIBsystem enabling increased system uptime, according to the presentinvention.

FIGS. 7A and 7B are example drawings that illustrate a sample beingpre-aligned with a first mask, and the sample subsequently beingprocessed with a BIB system containing a second mask

Like reference numerals refer to corresponding parts throughout theseveral views of the drawings. Generally, in the figures, elements thatare likely to be included in a given example are illustrated in solidlines, while elements that are optional to a given example areillustrated in broken lines. However, elements that are illustrated insolid lines are not essential to all examples of the present disclosure,and an element shown in solid lines may be omitted from a particularexample without departing from the scope of the present disclosure.

DETAILED DESCRIPTION OF EMBODIMENTS

Systems and methods for using broad ion beam (BIB) systems for moreefficient processing of multiple samples are disclosed herein. Morespecifically, the disclosure includes BIB systems that are configured toreceive and process one or more samples with an increased throughputand/or uptime over current BIB systems.

FIG. 1 is an illustration of a cross section 100 example BIB system(s)102 according to the present disclosure that are configured to moreefficiently process multiple samples 104. The BIB systems 102 include aBIB source 106 that is configured to emit a broad ion beam 108 along aBIB axis 110 toward a sample stage area 112. The broad ion beam 108 isconfigured such that, when portions of the broad ion beam 108 areincident up on the sample 104, the material of the sample upon which thebroad ion beam is incident are milled or otherwise removed from thesample. For example, in some embodiments the BIB source 106 may be an Arion source configured to emit a beam of Argon ions towards the samplestage 112.

The sample stage area 112 may include a mask 114 configured to block aportion of the broad ion beam 108 such that sample materialcorresponding to a portion of interest is not milled or otherwiseremoved from the sample 104 by incident ions. For example, FIG. 1illustrates a first portion of the cross section of the broad ion beam108(a) that is incident on the mask 114, and a second portion of thecross section of the broad ion beam 108(a) that is partially incident ona portion of the sample 104 whose material will be milled or otherwiseremoved by the broad ion beam 108. The mask 114 is composed of a hardmaterial that is not degraded by the broad ion beam 108 allowing it tobe used for the processing of multiple samples.

The sample stage area 112 may also include a holder interface configuredto receive a sample holder 116 such that it can be positioned and heldin relation to the mask 114 during processing of the sample 104 suchthat the mask protects portions of interest in the sample. In someembodiments, the sample stage area 112 may include a stage element thatis capable of translating, tilting, or rotating the sample 104/sampleholder 116. Additionally, in such embodiment the stage element may befurther configured to translate, tile, or rotate the sample 104/sampleholder 116 while the BIB source 106 emits the broad ion beam 108 towardthe sample 104. For example, the stage element may be configured toperiodically or continuously rotate the sample 104/sample holder 116through a series of predefined angular positions, and/or rock the sample104/sample holder 116 between two angular positions during milling withthe broad ion beam. Such a translation/tilting/rotating can be done at aconstant or varied speed. In this way, the stage element may dynamicallychange the portions of sample 104 irradiated by the broad ion beam 108to allow for more efficient or otherwise optimized removal of samplematerial and/or polishing of a region of interest by the BIB system 102.

The sample holder 116 is configured to hold the sample 104 duringprocessing as well as during transport of the sample 104 into the BIBsystem 102, out of the BIB system 102, and/or within the BIB system 102.FIG. 1 further shows the BIB system 102 as including one or moreadditional samples 104(a) held by corresponding additional sampleholders 116(a). In some embodiments, the BIB system 102 has one or moreoptional sample storage volumes/areas 118 that sample holders can beparked within the BIB system 102 when the sample 104 that they hold isnot currently being processed. FIG. 1 also shows the BIB system 102 asincluding a storage cassette 120 configured to hold a plurality ofsample holders 116 that is positioned within a cassette storage volume122. The storage cassette 120 is configured to allow many samples 104and their corresponding sample holders 116 to be transported to and/orloaded into the BIB system 102.

In some embodiments, the sample holder 116 may include one or moreoptional adjustment elements 124 that allow the sample 104 to betranslated, tilted, rotated, or otherwise repositioned in relation tothe sample holder 116, the broad ion beam 108, and/or the mask 114. Inembodiments with such adjustment elements 118, the BIB system 112 maycomprise one or more interface elements that allow a user to manipulatethe adjustment elements or the sample holder 116 itself so that thesample 104 has a desired geometric relationship with the mask 114 or afeature of the mask (e.g., the mask edge 114(a)). While FIG. 1illustrates the adjustment elements 124 as being screws, a person havingordinary skill in the art would understand that there are many types ofknown adjustment elements that are able to translate, tilt, rotate, orotherwise reposition samples in relation to various types of sampleholders. FIG. 1 also shows a sample holder manipulator 126 that isconfigured to reposition the sample holder 116 within the BIB system102. For example, the sample holder manipulator 126 may be configured tomove a sample holder between a sample holder storage volume 118 and thesample stage area 112. Moreover, in some embodiments, the sample holdermanipulator 126 may be further configured to interface with theadjustment elements 124 to cause a translation, tilting, rotation, etc.of the sample 104.

The BIB system 102 also includes a housing 128 that defines an interiorvolume 130. In some embodiments, the interior volume may be a sealedvolume that doesn't allow the passage of gas with the outsideenvironment. In such embodiments, the interior volume may include a pumpsystem 132 that is configured to adjust the pressure of the internalvolume and/or change the gaseous makeup of the environment within theinternal volume 130. For example, the pump system 132 may cause theinterior volume 130 to be at a lower pressure than the outside theenvironment and/or be at vacuum. While FIG. 1 illustrates at least aportion of the pump system 132 as being optionally included within theinterior volume, persons having skill in the art would understand thatsome or all of such a pump system 132 may be located outside of theinterior volume 130. Alternatively, the pump system 132 may cause thegaseous makeup of the environment with in the internal volume 130 to becomposed of inert gases (e.g., gases that do not interact with the broadion beam 108 and/or sample 104 material during processing). The BIBsystem 102 is also shown as having a sample holder port 134 throughwhich a sample holder 116 may be inserted into and/or removed from theBIB system 102. Moreover, FIG. 1 further illustrates the BIB system 102as having an optional cassette port 136 configured to allow a storagecassette 120 to be inserted into and/or removed from the BIB system 102.

FIG. 1 further shows the BIB system 102 as including a source housing138 that defines a source volume 140 that is configured to contain theBIB source 106. The source housing 138 also defines a BIB aperture 142that connects the source volume 140 with the interior volume 130, and aBIB source maintenance aperture 144 (e.g., flange, door, or other typeof sealable component that allows the source housing 138 to be switchedbetween a sealed and unsealed state from the outside environment) whichallows the BIB source 106 to be removed from or reinstalled within thesource volume 140 (i.e., the source maintenance aperture 144 allows theBIB source 106 to be removed or accessed via the aperture 144 whenunsealed). The BIB system 102 may further comprise a valve 146configured to switch between an open state where the ions emitted fromthe BIB source 106 are allowed to pass through the BIB aperture 142 fromthe source volume 140 to interior volume 130, and a sealed state wherethe valve 146 prevents ions or emissions from the sample 104 frompassing from the interior volume 130 to the source volume 130. A personhaving skill in the art would understand that valve 146 could correspondto any one of a shutter, a valve, a door, or other sealing mechanismthat is able to toggle between an open and closed state.

FIG. 1 shows the valve 146 in an open state such that the broad ion beam108 is allowed to pass into the interior volume so as to be incident onthe sample 104 and mask 114. In some embodiments, when the valve 146 isin a closed state, the source volume 140 may be opened to the externalenvironment (e.g., via the BIB source maintenance aperture 144) withoutaffecting the pressure within the interior volume. In this way, when thevalve 146 is in the closed state, the BIB source maintenance aperture144 can be opened to allow the BIB source 106 to be cleaned, adjusted,removed, replaced, and/or otherwise maintained without affecting thepressure or gaseous composition of the interior volume 130. In suchembodiments, the source volume 140 may further include an optional pumpsystem that is able to re-establish the pressure and/or gas compositionto match that of the interior volume 130. The BIB source maintenanceaperture 144 may comprise a port that is configured to switch between anopen state in which the first BIB source 106 can be removed from orreinstalled within the source volume 140, and a closed state in whichthe source volume 140 is sealed from the external environment.

Unlike a focused ion beam (FIB) system, the BIB system 102 does notcomprise an optical column that includes optical elements configured tofocus the ions emitted by the BIB source 106 so that it has a small spotsize in and around the sample plane of the sample 104. Because suchoptical elements are only able to focus, correct, tune, and/or otherwisemanipulate ion beams below certain strength thresholds, and since suchoptical elements are not required to focus the ions emitted by the BIBsource 106, the strength of the broad ion beam (i.e. the primary beamcurrent) used ion the BIB system 102 can be much greater than in FIBsystems. This increase in beam current allows BIB systems 102 to removesample material much faster than FIB systems. Applicant notes thatpersons having skill in the art will understand that some opticalelements may be included to focus the broad ion beam in the BIB system102, however the inclusion of such elements would impose lesser beamcurrent limitations on the BIB system 102 than in FIB systems.

Due to the increased beam strength of the broad ion beam 108, materialof the sample 104 upon which the broad ion beam 108 is incident isremoved at a faster rate over FIB milling processes. Specifically,because the broad ion beam 108 has a higher beam strength and isincident on a large area of the sample, the rate that material isremoved from the sample 104 is much higher than in FIB systems.Unfortunately, because of this increase in sample material removal,there is a proportional increase in material redeposition as theportions of the sample 104 that is removed by the broad ion beam 108redeposits on surfaces within the interior volume 130 and/or the sourcevolume 140. In current BIB systems this redeposition imposes a largeefficiency reduction, as redeposition on the BIB source 106 forces usersto frequently remove and/or otherwise access the BIB source 106 forcleaning and maintenance. Due to this cleaning and maintenance, currentBIB systems have a high rate of downtime where they cannot be used forsample processing.

FIG. 1 shows the BIB system 102 as including an optional additional BIBsource 148 that is configured to emit an additional broad ion beam alongemission axis 150. The additional BIB source 148 is illustrate as beingpositioned within an additional source volume 152 defined by anadditional source housing 154. The additional source housing 154 alsodefines an additional BIB aperture 156 that connects the additionalsource volume 148 with the interior volume 130, and an additional BIBsource maintenance aperture 158 which allows the additional BIB source148 to be removed from or reinstalled within the additional sourcevolume 148.

The BIB system 102 may further comprise an additional valve 160configured to switch between an open state where the ions emitted fromthe additional BIB source 148 are allowed to pass through the additionalBIB aperture 156 from the additional source volume 152 to interiorvolume 130, and a sealed state where the additional valve 160 preventsions or emissions from the sample 104 from passing from the interiorvolume 130 to the additional source volume 152. When the valve 160 is ina closed state, the additional source volume 152 may be opened to theexternal environment (e.g., via the additional BIB source maintenanceaperture 158) without affecting the pressure within the interior volume130. Thus, when the valve 160 is in the closed state, the BIB sourcemaintenance aperture 158 can be removed to allow the additional BIBsource 148 to be cleaned, adjusted, removed, replaced, and/or otherwisemaintained without affecting the pressure or gaseous composition of theinterior volume 130.

FIG. 1 shows the valve 160 in a closed state such sample material thatis removed from the sample 104 via the broad ion beam 108 are notallowed to pass into the additional source volume 152 and/or redepositon the additional BIB source 148. Because no redeposition occurs on theadditional BIB source 148 while the BIB source 130 is in use, accordingto the present invention, the additional BIB source 148 will be able tobe used to process the sample 104 (or additional samples) when the BIBsource 140 needs to be removed and/or accessed for cleaning and/ormaintenance. Thus, because the valve 146 can be closed to seal off thesource volume 140 from the interior volume 130, the valve 160 can beopened so that the additional BIB source 148 can be used to emit anadditional broad ion beam through the additional BIB aperture 156 toprocess samples. Therefore, in some embodiments of the presentdisclosure, the BIB system 102 is able to continuously process sampleswithout downtime greatly increasing its efficiency. Additionally, whilenot shown in FIG. 1 , in various embodiments the BIB system 102 maycomprise only one BIB source or may comprise three or more BIB sources.

FIG. 1 also shows the BIB system 102 as optionally including a lasersource 162 positioned within a laser volume 164 which may be configuredto emit an optical beam through a laser aperture 166 defined by a laserhousing 168. The optical beam emitted by the laser source 162 is of ahigher beam energy and/or strength that the broad ion beam 108, allowingthe optical beam to remove sample material upon which it is incident ata rate that is 10-50× greater that what is possible with a broad ionbeam. For example, in less than 10 minutes an optical laser can removeas much Nickle or Cobalt as a broad ion beam can remove in 90 minutes.Moreover, for harder materials such as graphite, it takes present broadion beams up to four hours to remove the same amount of material as anoptical beam can remove in less than 10 minutes.

However, while the removal of the sample material is more rapid with anoptical beam, milling and/or processing with the optical beam alsocauses damage/burning on the remaining sample surface. Therefore, inembodiments of the present invention, the BIB system 102 may use theoptical beam to rapidly remove initial portions of the sample 104, thefinal portions of the sample 104 which need to be removed are removedusing a broad ion beam from a BIB source (e.g., BIB source 106,additional BIB source 148, or another BIB source within the BIB system102). In this way, the optical beam may be used to remove a bulk portionof the sample 104, followed by a broad ion beam being used to expose aregion of interest and/or create a smoother or undamaged surface.

FIG. 1 further illustrates computing device(s) 170 associated with theBIB system 102. FIG. 1 illustrates computing device(s) 170 as beingseparate from the external devices 112, however in various embodimentsone or more of these elements may be combined. That is, applicant notesthat the computing device(s) 170 may be a component of the BIB system102, may be a separate device from the BIB system 102 in communicationvia a network communication interface, or a combination thereof.

Those skilled in the art will appreciate that the computing devices 170depicted in FIG. 1 are merely illustrative and are not intended to limitthe scope of the present disclosure. The computing system and devicesmay include any combination of hardware or software that can perform theindicated functions, including computers, network devices, internetappliances, PDAs, wireless phones, controllers, etc. The computingdevices 170 may also be connected to other devices that are notillustrated, or instead may operate as a stand-alone system. Inaddition, the functionality provided by the illustrated components mayin some implementations be combined in fewer components or distributedin additional components. Similarly, in some implementations, thefunctionality of some of the illustrated components may not be providedand/or other additional functionality may be available.

FIG. 1 further includes a schematic diagram illustrating an examplecomputing architecture 180 for the computing device(s) 170. Examplecomputing architecture 180 illustrates additional details of hardwareand software components that can be used to implement the techniquesdescribed in the present disclosure. In the example computingarchitecture 180, the computing hardware 170 of the BIB system 102includes one or more processors 182 and memory 184 communicativelycoupled to the one or more processors 182.

The example computing architecture 180 can include at least a controlmodule 188, and a sample processing module 190 stored in the memory 184.The example computing architecture 180 is further illustrated asincluding sample information 192 and processing schedule(s) 194 storedon memory 184. The sample information 192 may correspond to data thatdescribes characteristics of a sample, identification information forthe sample, a history of the sample, a status of the sample, apositioning of the sample on a sample holder, a composition of thesample, a region of interest within the sample, and a surface ofinterest on in the sample, etc. The processing schedule(s) 194 mayinclude one or more methods, settings, or instructions for processingthe sample 104 with the BIB system 102 to achieve desired results (i.e.,exposing an polishing a surface of interest within the sample 104 sothat it may be examined using a charged particle microscope system). Forexample, a processing schedule 194 may include steps of one or more ofthe methods shown and described in association with FIGS. 3-6 . A sampleprocessing schedule 194 for a sample may include a laser strength, alaser milling time, a portion of the sample to be removed with thelaser, a BIB strength, a BIB milling time, a portion of the sample to beremoved with BIB, a surface of interest, an processing order, sampleidentification information, a region of sample to be removed, or acombination thereof. For example, a sample processing schedule 194 maybe a data structure that identifies a plurality of steps that are to becarried out by components of the BIB system 102 in a particular order,where the data structure may also identify various parameters for thecomponents and/or individual steps. In some embodiments, such processingschedules 194 may be at least partially presented to a user of the BIBsystem 102 to guide the processing of the sample, may be at leastpartially used by the computing device(s) 170 to automate and/or adjustsettings associated with the processing of the sample, or a combinationthereof.

In some embodiments, sample information 192 and/or individual processingschedule(s) 194 may be entered into the computing device 170 by a user(e.g., using a keypad, keyboard, mouse, voice command, touchscreen,etc.), received via a hardware connection (e.g., CD/DVD, USB, HDMI,portable memory, etc.), received over a network connection (e.g.,Bluetooth, Wi-Fi, the Internet, etc.), received in association with thesample being inserted into the BIB system 102 (e.g., accessible memoryon the sample holder 116), generated based on sensor information orsample information 192, or a combination thereof. For example, in anexample embodiment the BIB system 102 may be configured to receive anidentifier via an RFID on the sample holder 116, access sampleinformation 192 associated with the identifier over a networkconnection, and then identify or generate a processing schedule 194 forthe sample 104 based on the identifier, the sample information, or both.

As used herein, the term “module” is intended to represent exampledivisions of executable instructions for purposes of discussion and isnot intended to represent any type of requirement or required method,manner, or organization. Accordingly, while various “modules” aredescribed, their functionality and/or similar functionality could bearranged differently (e.g., combined into a fewer number of modules,broken into a larger number of modules, etc.). Further, while certainfunctions and modules are described herein as being implemented bysoftware and/or firmware executable on a processor, in other instances,any or all of modules can be implemented in whole or in part by hardware(e.g., a specialized processing unit, etc.) to execute the describedfunctions.

The control module 188 can be executable by the processors 182 to causea computing device 170 and/or BIB system 102 to take one or more actionsand/or perform a step of a sample processing schedule. In someembodiments, the control module 188 may be executable to adjust thesettings of individual components of the BIB system 102 (e.g., BIBsource, laser source, etc.), cause individual components of the BIBsystem 102 to perform particular operations (e.g., move the sampleholder within the BIB system 102, open or close valves, emit a broad ionbeam, emit an optical beam, align the sample, adjust pressure settingsor gases present in a volume 130, 140, and/or 152, etc.), or acombination thereof. For example, the control module 188 may beexecutable to cause the sample holder manipulator 126 to engage with adesired sample holder 116 stored within the BIB system 102 (e.g., storedin a storage cassette 120 positioned within a cassette storage volume122, stored in a sample holder storage volume 118, etc.) and totranslate, tilt, and/or rotate the engaged sample holder 116 to thesample stage area 112 so that it is nested with the mask 114 and thesample 104 has a desired geometric relationship with the mask 114. Insuch examples, the control module 118 may be further executable toreturn said sample holder 116 to the place it was stored within the BIBsystem 102 once the sample 104 has been processed, and then engage withan additional sample holder 116, and then translate the additionalsample holder 116 to the sample stage area 112 so that the additionalsample 104 can be processed.

Alternatively, or in addition, the control module 188 may cause adisplay 186 to present a processing protocol to a user, presentinformation about the sample being processed, etc. For example, thecontrol module 188 may present video/image information of the alignmentof the sample with the mask 114, a surface of the sample 104 beingremoved/polished/processed, etc. In some embodiments, the control module188 may cause the display 186 to present a graphical user interface thatincludes selectable interfaces that allow a user to input and/or alterdata associated with the sample 104 and/or select protocol steps orcomponent configurations that are to be used when processing the sample104.

The sample processing module 190 can be executable by the processors 182to at least partially automate the processing of samples 104 by the BIBsystem 102. For example, the sample processing module 190 may beexecutable to reposition sample holder(s) 116 in the BIB system 102,access sample information 192 for the sample, determine a processingschedule 194 for the sample 104, adjust the configuration of componentsof the BIB system 102 drive, and/or cause the components of the BIBsystem 102 to perform the processing of a sample 104. According to thepresent invention, the sample processing module 190 may obtain sampleinformation 192 for a sample 104 that is to be processed. In variousembodiments, the sample processing module 190 may obtain the informationby receiving it from a user input, over a hardwire or wirelessconnection. Alternatively, or in addition, the sample processing module190 may obtain the information by determining it based on sensorinformation.

The sample processing module 190 may also be executable to determinedesired component configurations for the components of the BIB system102 based on user input, sample information 192 for the sample 104, aprocessing schedule 194 associated with the sample 104, or a combinationthereof. For example, based on sample information 192 indicating thecomposition of the sample material that is to be removed and the amountof material that is to be removed, the sample processing module 190 maydetermine a desired broad ion beam strength (e.g., BIB current,accelerating voltage, stage rocking, etc.) and time of irradiation withthe broad ion beam required to process the sample 104, and may adjustthe BIB source 106 configurations and/or the associated processingschedule 194 accordingly.

Additionally, sample processing module 190 may also be executable toobtain a processing schedule 194 associated with a sample 104 that is tobe processed. Obtaining the processing schedule 194 may correspond toaccessing a predetermined processing schedule from an accessible datastructure, modifying a predetermined processing schedule, generating aprocessing schedule for the sample, or a combination thereof. Forexample, after determining an identifier of a sample (e.g., by scanninga barcode on the sample holder 116) the sample processing module 190 mayuse the identifier to access sample information 192 and/or a processingschedule 194 from a data structure stored on an accessible memory.Alternatively, or in addition, a user may enter an identifier for thesample, sample information 194, a desired result of the process, a typeof processing to occur, etc., which the sample processing module 190 canuse to generate a tailored processing schedule 194 that will cause theBIB system 102 to perform the desired processing of the sample. Forexample, based on the specifications of the processing schedule 194, thesample processing module 190 may cause the BIB system 102 to process oneor more samples 104 using any of the methods shown in FIGS. 3-6 . Insome embodiments, the sample processing module 190 may provide a seriesof GUI's on the display 186 that allow a user to approve and/or giveinstructions to execute a step of the processing schedule 194. Thesample processing module 190 may further be executable to perform someor all of the steps of the processing schedule 194 independent from userinput.

The sample processing module 190 can be further executable by theprocessors 182 to automatically move sample holders 116 within the BIBsystem 102 so that many samples 104 can be processed in succession. Forexample, based on a user input identifying a plurality of samples thatare to be processed, the sample processing module 190 may cause thesample holder manipulator 126 to sequentially move the associated sampleholders 116 between storage locations (e.g., a storage cassette 120positioned within a cassette storage volume 122, a sample holder storagevolume 118, etc.) and the sample stage area 112 so that each of theidentified samples can be processed. Because the sample processingmodule 190 is further configured to cause the BIB system 102 to performsome or all of the processing steps without user input, the sampleprocessing module 190 allows the BIB system 102 to automatically processa plurality of samples is quick succession and without user oversight.In this way, the BIB systems 102 of the present disclosure allows asingle user to monitor the sample processing of many samples across aplurality of BIB systems 102, and/or BIB systems 102 to be left withoutuser oversight to process a series of samples over long periods of time.

The computing devices 170 include one or more processors configured toexecute instructions, applications, or programs stored in a memory(s)accessible to the one or more processors. In some examples, the one ormore processors may include hardware processors that include, withoutlimitation, a hardware central processing unit (CPU), a graphicsprocessing unit (GPU), and so on. While in many instances the techniquesare described herein as being performed by the one or more processors,in some instances the techniques may be implemented by one or morehardware logic components, such as a field programmable gate array(FPGA), a complex programmable logic device (CPLD), an applicationspecific integrated circuit (ASIC), a system-on-chip (SoC), or acombination thereof.

The memories accessible to the one or more processors are examples ofcomputer-readable media. Computer-readable media may include two typesof computer-readable media, namely computer storage media andcommunication media. Computer storage media may include volatile andnon-volatile, removable, and non-removable media implemented in anymethod or technology for storage of information, such as computerreadable instructions, data structures, program modules, or other data.Computer storage media includes, but is not limited to, random accessmemory (RAM), read-only memory (ROM), erasable programmable read onlymemory (EEPROM), flash memory or other memory technology, compact discread-only memory (CD-ROM), digital versatile disk (DVD), or otheroptical storage, magnetic cassettes, magnetic tape, magnetic diskstorage or other magnetic storage devices, or any other non-transmissionmedium that may be used to store the desired information and which maybe accessed by a computing device. In general, computer storage mediamay include computer executable instructions that, when executed by oneor more processing units, cause various functions and/or operationsdescribed herein to be performed. In contrast, communication mediaembodies computer-readable instructions, data structures, programmodules, or other data in a modulated data signal, such as a carrierwave, or other transmission mechanism. As defined herein, computerstorage media does not include communication media.

Those skilled in the art will also appreciate that items or portionsthereof may be transferred between memory and other storage devices forpurposes of memory management and data integrity. Alternatively, inother implementations, some or all of the software components mayexecute in memory on another device and communicate with the computingdevices 170. Some or all of the system components or data structures mayalso be stored (e.g., as instructions or structured data) on anon-transitory, computer accessible medium or a portable article to beread by an appropriate drive, various examples of which are describedabove. In some implementations, instructions stored on acomputer-accessible medium separate from the computing devices 170 maybe transmitted to the computing hardware and the computing devices 170via transmission media or signals such as electrical, electromagnetic,or digital signals, conveyed via a communication medium such as awireless link. Various implementations may further include receiving,sending, or storing instructions and/or data implemented in accordancewith the foregoing description upon a computer-accessible medium.

FIG. 2 is an illustration of an example environment 200 where BIBsystem(s) 102 for more efficient processing of multiple samples within asample preparation workflow. Specifically, FIG. 2 illustrates theenvironment 200 as including a sample preparation station 202, a sampletransportation device 250, a BIB system 102, and a charged particlemicroscope 260. However, persons having skill in the art will understandhow different stations, components, and devices may be used to allow theBIB systems 102 according to the present disclosure to efficientlyprocess samples. For example, the example environment 200, or componentelements/stations/devices therein, may be used to practice the methodsdescribed in FIGS. 3-6 as well as other processes described herein.

FIG. 2 illustrates the sample preparation station 202 as being a hoodedwork area having a controlled pressure and atmospheric gas composition.Specifically, FIG. 2 shows the sample preparation station 202 comprisinga barrier material 204 that defines a working volume 206 and one or moreoptionally sealable apertures 208 through which components can be passedbetween the working volume 206 and the outside environment. However, apersona having skill in the art would understand that the samplepreparation station 202 may correspond to an open environment.Additionally, while the sample preparation station 202 is illustrated inFIG. 2 as being separate from the BIB system 102, a person having skillin the art would understand that in some embodiments the samplepreparation station 202 may be included within the BIB system 102 in aseparate chamber form the interior volume such that a sample may bealigned on a sample holder in the sample preparation station 202 while adifferent sample is processed by a BIB source within the interior volumeof the BIB system 102.

In some embodiments, a user can select the pressure and atmospheric gascomposition within the working volume 206 so that they are optimal forpreparation of a desired sample 210 type. The working volume 206 isdepicted as containing example elements for preparing samples 210 forprocessing in BIB systems 102. For example, the working volume 206 isshown as including a plurality of samples 210 that have beenharvested/generated and prepared for examination, a plurality of emptysample holders 212 upon which the samples 210 can be positioned, anexample aid 214 for aligning/positioning the sample on a sample holder,and sample holders 216 that contain a sample. While the example aid 214is illustrated as being an optical microscope system, a person havingskill in the art will understand that different types of samples210/preparation workflows may require different types of aids tooptimally align/position samples on the sample holder.

In some embodiments of the present invention, the preparation stationfurther includes an additional mask 218 for aligning the sample 210 onthe sample holders 212. The additional mask 218 is geometricallyconfigured such that when a sample is aligned and/or positioned to havea certain geometric relationship between the sample and an edge of theadditional mask 218 when the sample holder is nested with the additionalmask 218, then the sample 210 will have the same certain geometricrelationship between the sample and the edge of the mask 114(a) when thesample holder is nested with the mask 114 within the BIB system 102.This geometric similarity between the mask 114 and the additional mask218 allows for samples to be aligned on their respective sample holderswithout taking up potential time in which the BIB system 102 can beprocessing samples with broad ion and/or optical beams. In someembodiments, aligning the sample within the sample preparation station202 may correspond to an optically aligning the sample without the useof the additional mask 218. For example, a sample may be opticallyaligned with respect to the sample holder by adjusting an adjustableportion of the sample holder such that the sample will be in a desiredposition with the sample holder is nested with the mask 114 within theBIB system 102. Example methods for optically aligning the sample inthis way include, but are not limited to adjusting a sample edge to amarked position (e.g., using an optical microscope and/or an imagerecognition algorithm), using a laser gate sensing to determine desiredpositioned, etc.

Additionally, FIG. 2 shows the sample preparation system as including astorage cassette 220 that is configured to hold a plurality of sampleholders 216. The storage cassette 220 is configured to allow manysamples 204 and their corresponding sample holders 216 to be transportedto and/or loaded into the BIB system 102. In this way, a user can usethe additional mast 218 to pre-align each multiple samples 210 and thenload them within a storage cassette 220.

FIG. 2 further shows an optional sample transportation device 204 thatis configured to transport the sample holder 216 between the samplepreparation station 202 and the BIB system 102 and/or between the BIBsystem 102 and the charged particle microscope 206. In some embodiments,the sample transportation device 204 may maintain a desired pressureand/or gas environment around the sample holder 216 duringtransportation. In such embodiments, the sample transportation device204 allow a sample to be prepared in the sample preparation station 202,processed in the BIB system 102, and investigated in the chargedparticle microscope 206 without being exposed to a pressure or gas otherthan the desired pressure and/or gas environment. Alternatively, thesample holder 216 or the storage cassette 220 may be themselvestransported between the sample preparation station 202 and the BIBsystem 102. In some embodiments, the storage cassette 220 may be able tomaintain the plurality of sample holders 216 it contains at a desiredpressure and/or gas environment.

FIG. 2 further shows the example environment 200 as including exampleBIB system(s) 102 as described in association with FIG. 1 . The BIBsystems 102 include a BIB source 106 and an optional additional BIBsource 148 that are configured to emit a broad ion beam along a BIB axistoward a sample stage area 112. The broad ion beam is configured suchthat, when portions of the broad ion beam incident up on the sample 210,the material of the sample upon which the broad ion beam is incident aremilled or otherwise removed from the sample. The sample stage area 112may include a mask 114 configured to block a portion of the broad ionbeam such that sample material corresponding to a portion of interest isnot milled or otherwise removed from the sample 210 by incident ions.The sample stage area 112 may also include a holder interface configuredto receive a sample holder 216 such that it can be positioned and heldin relation to the mask 114 during processing of the sample 210 suchthat the mask protects portions of interest in the sample. BIB system102 is further shown as including an optional laser source 162. The BIBsystems 102 are configured to process samples as described in thediscussion of FIG. 1 and/or according to the methods described in FIGS.3-6 as well as other processes described herein.

Example environment 200 is further depicted as including chargedparticle microscope system(s) 206 for inspection of a sample 210 thathas been processed with a BIB system 102 according to the presentinvention. The example charged particle microscope system(s) 206 mayinclude electron microscope (EM) setups or electron lithography setupsthat are configured to irradiate and/or otherwise impinge the sample 210with a beam of electrically charged particles 222 (usually an electronbeam or an ion beam). In various embodiments the charged particlemicroscope system 206 may be or include one or more different types ofEM and/or charged particle microscopes, such as, but not limited to, ascanning electron microscope (SEM), a scanning transmission electronmicroscope (STEM), a transmission electron microscope (TEM), a chargedparticle microscope (CPM), dual beam microscopy system, etc.Additionally, in some embodiments a TEM is capable of operating as aSTEM as well. FIG. 2 shows the example charged particle microscopesystem(s) 206 as being a scanning electron microscope (SEM) 224.

FIG. 3 depicts a sample process 300 for processing samples with a dualBIB system enabling increased system uptime, according to the presentinvention. The process 300 may be implemented with any of the BIBsystems 102, in any environment, including any of the exampleenvironment(s) 200 for more efficient processing of multiple sampleswithin a sample preparation workflow.

At step 302, a sample to be processed is optionally determined. Forexample, the sample to be processed may be determined based on an inputreceived from a user via an interface on the BIB system, or via anassociated computing device. Alternatively, the sample to be processedmay be determined by the BIB system or an associated computing deviceaccessing a data structure (i.e., table, schedule, metadata, etc.)and/or execute instructions that result in the determination of the nextsample to be processed. For example, a BIB system may be configured suchthat it sequentially accesses a plurality of sample holders that arestored within it, allowing a user to preload a number of samples intothe BIB system to be automatically processed in series. In such anexample, the BIB system of associated computing device would keep trackof the order the samples are to be processed which sample of theplurality is next to be processed.

At step 304, a processing schedule for the sample is determined. Aprocessing schedule for the sample corresponds to the BIB systemconfigurations and workflow settings that are to be followed to achievea desired processing result for the sample (e.g., a BIB strength, a BIBmilling time, a portion of the sample to be removed with BIB, a surfaceof interest, or a combination thereof). In some embodiments, theprocessing schedule may be input by a user by selecting a processingschedule from a list of premade processing schedules,inputting/generating a new processing schedule, inputting individualstep or configuration instructions, or a combination thereof. Forexample, an associated computer may present a graphical user interfacethat includes selectable interfaces that allow a user to input and/oralter data associated with the sample and/or select protocol steps orcomponent configurations that are to be used when processing the sample.In another example, in cases where a BIB system is frequently used toprocess a particular type of sample to prepare it for a certainexamination modality, the BIB system or associated computer may havestored an associated processing schedule that a user can select (eithermanually or via metadata associated with the sample, sample holder,etc.) to initiate the frequently used processing configuration/workflow.

In some embodiments, the processing schedule may be received with sampleinformation associated with the sample to be processed. Sampleinformation includes one or more of a sample identification information,sample composition, a region of interest, a surface of interest,associated processing schedules, etc. Alternatively, or in addition, theBIB system or associated computing system may use predefinedrules/instructions to determine the processing schedule for the samplebased on the sample information. For example, a user may enter anidentifier for the sample which the BIB system may use to access a datastructure that specifies the relevant sample information, which the BIBsystem then uses predefined rules to create a tailored processingschedule that will cause the BIB system to perform the desiredprocessing of the sample. As an example, the BIB system may set the beamstrength of the broad ion beam based on the material composition that isto be removed, and/or adjust the milling time based on the amount of thematerial that is to be removed.

At step 306, the sample is prepared for processing. Preparing the samplefor processing may include harvesting the sample from a larger specimenor otherwise generating the sample (e.g., growing or depositing portionsof the sample), loading the sample onto a sample holder, aligning thesample, transporting the sample to the BIB system, transporting thesample holder to a sample stage area within the BIB system, etc. Forexample, the BIB system may cause a component sample holder transportingelement to retrieve a sample holder associated with the sample to beprocessed from a storage area, and translate, tilt, and/or rotate thesample holder so that the geometric relationship between the sample anda protective mask is such that the mask will protect desired portions ofthe sample during irradiation/milling.

At step 308, a BIB source is caused to emit a broad ion beam toward thesample. FIG. 3 further shows step 310 as being performable while thebroad ion beam is being emitted toward the sample. At step 310 anadditional BIB source is accessed. According to the present invention,the additional BIB source is positioned within a volume that can beselectable sealed from the interior of the BIB system via a valve. Inthis way, when the valve is closed, milled material from the samplecannot pass into the volume containing the additional BIB source.Additionally, in some embodiments the pressure and/or gaseous makeup isnot affected when the additional BIB source is accessed. In variousembodiments, accessing the additional BIB source at 310 may include oneor more of removing the additional BIB source 312 from the BIB system(e.g., for cleaning, adjustment, repair, etc.), performing maintenanceon the additional BIB system 314 (e.g., cleaning, aligning, etc.),replacing the additional BIB source 316 (e.g., reinstalling the BIBsource after cleaning/maintenance), and/or installing a new BIB source318 in the BIB system.

At step 320, portions of the sample are removed with the broad ion beam.According to the present invention, step 320 may include milling with asource different from the broad ion beam, such as the dual optical andion milling process described in FIG. 4 . In step 320 portions of thesample that are not shielded by the protective mask are removed from thesample. In this way, a region of interest and/or portion of the samplethat will be subject to additional processing may be rapidly exposed.

At step 322, it is determined whether another sample is to be milled. Ifthe answer at 322 is yes, then the process returns to step 302 and thesample that is to be processed is determined. In this way, numeroussamples can be processed while the additional BIB system is beingaccessed. If the answer at 322 is no, then the process 300 may end.

FIG. 4 depicts a sample process 400 for processing samples with a dualmode, optical and BIB milling system for more efficient sampleprocessing, according to the present invention. The process 400 may beimplemented with any of the BIB systems 102, in any environment,including any of the example environment(s) 200 for more efficientprocessing of multiple samples within a sample preparation workflow.

At step 402, a sample to be processed is optionally determined. Forexample, the sample to be processed may be determined based on an inputreceived from a user via an interface on the BIB system, or via anassociated computing device. Alternatively, the sample to be processedmay be determined by the BIB system or an associated computing deviceaccessing a data structure (i.e., table, schedule, metadata, etc.)and/or execute instructions that result in the determination of the nextsample to be processed.

At step 404, a processing schedule for the sample is determined. Aprocessing schedule for the sample corresponds to the BIB systemconfigurations and workflow settings that are to be followed to achievea desired processing result for the sample (e.g., a BIB strength, a BIBmilling time, a portion of the sample to be removed with BIB, a surfaceof interest, or a combination thereof). In various embodiments, theprocessing schedule may be input by a user, received with sampleinformation associated with the sample to be processed, or determined bythe BIB system (e.g., based on the sample information).

At step 406, the sample is prepared for processing. Preparing the samplefor processing may include harvesting the sample from a larger specimenor otherwise generating the sample (e.g., growing or depositing portionsof the sample), loading the sample onto a sample holder, aligning thesample, transporting the sample to the BIB system, transporting thesample holder to a sample stage area within the BIB system, etc. Forexample, the BIB system may cause a component sample holder transportingelement to retrieve a sample holder associated with the sample to beprocessed from a storage area, and translate, tilt, and/or rotate thesample holder so that the geometric relationship between the sample anda protective mask is such that the mask will protect desired portions ofthe sample during irradiation/milling.

At step 408, a laser source is caused to emit an optical beam (e.g.,laser) toward the sample. The optical beam emitted by the laser sourceis of a higher beam energy and/or strength than a broad ion beam. Atstep 410, a first portion of the sample are removed with the opticalbeam. Because of the increased strength of the optical beam, it canremove sample material upon which it is incident at a rate that is10-50× greater that what is possible with a broad ion beam. However,while the removal of the sample material is more rapid with an opticalbeam, milling and/or processing with the optical beam also causesdamage/burning on the remaining sample surface.

At step 412. a BIB source is caused to emit a broad ion beam toward thesample, and at step 414, a second portion of the sample are removed withthe broad ion beam. Because the broad ion beam is able to remove samplematerial without damaging the sample surface, the broad ion beam is ableto remove final portions of the sample (i.e., damaged portions of thesample) without causing further damage to the sample. In this way, oncea large portion of material is rapidly removed with the optical beam,the broad ion beam can be used to remove final portions of the sample toexpose a region of interest.

FIG. 5 depicts a sample process 500 for a processing multiple sampleswithin a dual BIB system with reduced downtime, according to the presentinvention. The process 500 may be implemented with any of the BIBsystems 102, in any environment, including any of the exampleenvironment(s) 200 for more efficient processing of multiple sampleswithin a sample preparation workflow.

At step 502, a sample to be processed is optionally determined. Forexample, the sample to be processed may be determined based on an inputreceived from a user via an interface on the BIB system, or via anassociated computing device. Alternatively, the sample to be processedmay be determined by the BIB system or an associated computing deviceaccessing a data structure (i.e., table, schedule, metadata, etc.)and/or execute instructions that result in the determination of the nextsample to be processed.

At step 504, a processing schedule for the sample is determined. Aprocessing schedule for the sample corresponds to the BIB systemconfigurations and workflow settings that are to be followed to achievea desired processing result for the sample (e.g., a BIB strength, a BIBmilling time, a portion of the sample to be removed with BIB, a surfaceof interest, or a combination thereof). In various embodiments, theprocessing schedule may be input by a user, received with sampleinformation associated with the sample to be processed, or determined bythe BIB system (e.g., based on the sample information).

At step 506, a sample holder associated with the sample to be processedis removed from a storage location within the BIB system. For example,the BIB system may cause a component sample holder transporting element(e.g., sample holder manipulator) to retrieve a sample holder associatedwith the sample to be processed from a storage area within the BIBsystem and/or from within a sample storage/transport device (e.g., astorage cassette).

At step 508, the sample holder is positioned in a sample stage area.Specifically, the sample holder may be translated, tilted, and/orrotated by a sample holder transporting element such that a geometricrelationship between the sample and a protective mask is such that themask will protect desired portions of the sample duringirradiation/milling. In some embodiments, the sample may also be alignedwith the mask based on user and/or sensor input. Alternatively, or inaddition, the sample may have been realigned using a workflow such asthe one described in FIG. 6 .

At step 510, the sample is processed. Specifically, a BIB source iscaused to emit a broad ion beam toward the sample. First portions of thesample upon which the broad ion beam is incident are milled away, whilesecond portion of the sample that the protective mask of the BIB sourceblocks is not milled away. Alternatively, or in addition, the sample maybe processed in the BIB system using other sample preparation workflows,including but not limited to, the processes described herein.

At step 512, the sample holder is removed from the sample stage area.That is, the sample holder is translated, tilted, and/or rotated by thesample holder transporting element so that the sample holder is eitherstored in a storage location, a sample transport device, or transportedthrough a port out of the BIB system.

At step 514, it is determined whether another sample is to be processed.If the answer at 514 is yes, then the process returns to step 502 andthe sample that is to be processed is determined. If the answer at 514is no, then the process 500 may end.

FIG. 6 depicts a sample process 300 for processing samples with a BIBsystem enabling increased system uptime, according to the presentinvention. The process 600 may be implemented with any of the BIBsystems 102, in any environment, including any of the exampleenvironment(s) 200 for more efficient processing of multiple sampleswithin a sample preparation workflow.

At step 602, a sample is obtained. Specifically, the sample may beobtained by harvesting the sample from a larger specimen, growing ordepositing portions of the sample, milling away portions of a largersample, or a combination thereof.

At step 604, the sample is affixed to a sample holder, and at step 606,nesting the sample holder with a first mask. The first mask isgeometrically similar to a second protective mask within a BIB systemsuch that a sample that is in a desired alignment with relation to thefirst mask will also be in the desired alignment with the second sample.That is, when the sample is aligned to a desired position on the sampleholder with the first mask, it does not need to be further aligned whenthe sample holder is subsequently nested in the second mask in the BIBsystem.

At step 608, aligning the sample with the first mask. For example, auser may use an optical microscope, sensors, or eyesight to manipulatesample alignment elements on the sample holder so that the sample istranslated, tilted, or rotated until it is in a desired alignmentposition. Once the sample is aligned, the sample holder can betranslated to a sample storage area within the BIB system and/or fromwithin a sample storage/transport device (e.g., a storage cassette). Forexample, after a sample is pre-aligned in this way, the sample holdermay be transported to a storage location in the BIB system in which thesample is to be processed. In some embodiments, the BIB system may havea separate sample alignment chamber in which some or all of steps602-608 may be performed, and a sample manipulation element maytransport the sample holder containing the aligned sample into a storagelocation within the BIB system. In this way, as a user is aligningsamples with the first mask, the BIB system can be processingpre-aligned samples using the second mask.

In an alternative example, once the sample is aligned with the firstmask, the sample may be loaded onto a sample transport device thatprotect the sample during transportation/loading into the BIB system inwhich they will be processed. Such a transport device may be configuredto transport a single sample holder or many sample holders. In someembodiments, the transport devices may preserve a pressure or gaseousenvironment around the sample during transport. In this way, a samplecan be prepared in a sample preparation area having a controlledpressure and/or gaseous composition, and then transported to the BIBsystem without exposing the sample to a new pressure/gaseouscomposition.

At step 610, it is determined whether another sample is to be aligned.If the answer at 610 is yes, then the process returns to step 602 andanother sample is obtained. In this way, multiple samples can bepre-aligned and loaded into a sample storage area within the BIB systemand/or from within a sample storage/transport device. Because a user canalign many samples in a continuous manner, the throughput of the samplepreparation across a plurality of samples using this method can begreatly streamlined.

If the answer at 610 is no, then the process 600 continues at step 612where the sample holder is nested with a second mask within a BIBsystem. Because the sample was pre-aligned with the first mask, when thesample holder is nested with the second mask it does not need furtheralignment. This greatly increases the speed at which samples can beprocessed within the system.

At step 614, the sample is processed with the BIB system. For example,portion of the sample can be removed with an optical or broad ion beamaccording to any of the processes described herein. Additionally, sincemuch of the user input that is presently needed by current BIB systemsis related to the alignment process, by pre-aligning the samples usingthis process, the required user input can be performed all at onceduring the alignment of multiple samples, and the remaining processingsteps can be at least partially automated such that a BIB systemaccording to the present invention is able to process multiplepre-aligned samples with little or no user input/oversight.

At step 616, it is determined whether another sample is to be processed.If the answer at 616 is yes, then the process returns to step 612 andanother sample holder is nested with the second mask. If the answer at616 is no, then the process 600 may end.

FIGS. 7A and 7B are example drawings that illustrate a sample 702 beingpre-aligned with a first mask 704, and the sample 702 subsequently beingprocessed with a BIB system containing a second mask 706. Specifically,FIG. 7A shows the sample 702 being aligned on a sample holder 708 usingan optical microscope 710. FIG. 7B shows the sample 704 being processedwithin a BIB system using a broad ion beam 712 from a BIB source 714.Because the sample 702 was pre-aligned with the first mask 704, andbecause the second mask 706 is geometrically similar to the first mask704, the sample 702 does not need to be aligned/positioned within theBIB system.

Examples of inventive subject matter according to the present disclosureare described in the following enumerated paragraphs.

A1. A broad ion beam (BIB) sample preparation system having improveduptime, the BIB sample preparation system comprising: a housing definingan interior volume; a sample stage positioned within the interiorvolume, wherein the sample stage is configured to hold a sample holderduring polishing of a sample held by the sample holder; a first BIBsource configured to emit a first broad ion beam towards the sample whenin use, wherein the first BIB source is positioned within a first sourcehousing; and a second BIB source configured to emit a second broad ionbeam towards the sample when in use, wherein the first BIB source ispositioned within a first source housing, wherein the second BIB sourceis configured to be removed while the first BIB source is emitting thefirst broad ion beam toward the sample.

A2. The BIB sample preparation system of paragraph A1, wherein thesecond source is further configured to be reinstalled while the firstBIB source is emitting the first broad ion beam toward the sample.

A2.1. The BIB sample preparation system of paragraph A2, wherein thefirst source is configured to be removed while the second source isemitting the second broad ion beam toward the sample.

A2.2. The BIB sample preparation system of any of paragraphs A2-A2.2,wherein the first source is configured to be reinstalled while thesecond BIB source is emitting the second broad ion beam toward thesample.

A3. The BIB sample preparation system of any of paragraphs A1-A2.2,wherein the first source housing and the second source housing are eachat least partially located within the interior volume.

A4. The BIB sample preparation system of any of paragraphs A1-A3,wherein the first source housing at least partially defines: a firstvolume which includes the first BIB source; and a first aperture thatconnects the first volume with the interior volume.

A4.1. The BIB sample preparation system of paragraph A4, furthercomprising a first valve configured to switch between: an open statewhere the ions emitted from the first BIB source are allowed to passthrough the first aperture from the first volume to interior volume; anda sealed state where the first valve prevents ions or emissions from thesample from passing from the interior volume to the first volume.

A4.1.1. The BIB sample preparation system of paragraph A4.1, whereinwhen the first valve is in the sealed state, the first volume may beopened to an external environment without affecting the pressure withinthe interior volume.

A4.1.2. The BIB sample preparation system of any of paragraphsA4.1-A4.1.1, wherein when the first valve is in the sealed state, thefirst volume may be opened to an external environment without affectingthe composition of gases within the interior volume.

A4.1.3. The BIB sample preparation system of any of paragraphsA4.1-A4.1.2, wherein when the first valve is in the sealed state, thefirst BIB source can be at least one of removed and reinstalled from theBIB sample preparation system without affecting the pressure or gascomposition within the interior volume.

A4.1.4. The BIB sample preparation system of any of paragraphsA4.1-A4.1.3, wherein when the first valve is in the sealed state, thefirst volume may be opened to an external environment without breaking avacuum in the interior volume.

A4.1.5. The BIB sample preparation system of any of paragraphsA4.1-A4.1.4, wherein the first valve corresponds to one of a shutter, avalve, or a door.

A4.2. The BIB sample preparation system of any of paragraphs A4-A4.1.5,wherein the first housing further defines a first BIB source maintenanceaperture which allows the first BIB source to be removed from orreinstalled within the first volume.

A4.2.1. The BIB sample preparation system of paragraph A4.1, furthercomprising a first access port that is configured to switch between: anopen state in which the first BIB source can be removed from orreinstalled within the first volume; and a closed state the first volumeis sealed from the external environment.

A4.2.2. The BIB sample preparation system of paragraph A4.2.1, whereinthe first housing is configured to, when the first valve and the firstaccess port are each in the closed state, allow the first volume to bepressurized independently of the interior volume or the second volume.

A5. The BIB sample preparation system of any of paragraphs A1-A4.2.2,wherein the second source housing at least partially defines: a secondvolume which includes the second BIB source; and a second aperture theconnects the second volume with the interior volume.

A5.1. The BIB sample preparation system of paragraph A5, furthercomprising a second valve configured to switch between: an open statewhere the ions emitted from the second BIB source are allowed to passthrough the second aperture from the second volume to interior volume;and a sealed state where the second valve prevents ions or emissionsfrom the sample from passing from the interior volume to the secondvolume.

A5.1.1. The BIB sample preparation system of paragraph A5.1, whereinwhen the first valve is in the sealed state, the first volume may beopened to an external environment without affecting the pressure withinthe interior volume.

A5.1.2. The BIB sample preparation system of any of paragraphsA5.1-A5.1.1, wherein when the first valve is in the sealed state, thefirst volume may be opened to an external environment without affectingthe composition of gases within the interior volume.

A5.1.3. The BIB sample preparation system of any of paragraphsA5.1-A5.1.21, wherein when the first valve is in the sealed state, thefirst BIB source can be at least one of removed and reinstalled from theBIB sample preparation system without affecting the pressure or gascomposition within the interior volume.

A5.1.4. The BIB sample preparation system of any of paragraphsA5.1-A5.1.3, wherein when the first valve is in the sealed state, thefirst volume may be opened to an external environment without breaking avacuum in the interior volume.

A5.1.5. The BIB sample preparation system of any of paragraphsA5.1-A5.1.4, wherein the second valve corresponds to one of a shutter, avalve, or a door.

A5.2. The BIB sample preparation system of any of paragraphs A5-A5.1.5,wherein the second housing further defines a second BIB sourcemaintenance aperture which allows the second BIB source to be removedfrom or reinstalled within the second volume.

A5.2.1. The BIB sample preparation system of paragraph A5.1, furthercomprising a second access port that is configured to switch between: anopen state in which the second BIB source can be removed from orreinstalled within the second volume; and a closed state the secondvolume is sealed from the external environment.

A5.2.2. The BIB sample preparation system of paragraph A5.2.1, whereinthe second housing is configured to, when the second valve and thesecond access port are each in the closed state, allow the second volumeto be pressurized independently of the interior volume or the firstvolume.

A6. The BIB sample preparation system of any of paragraphs A1-A5.2.2,further comprising one or more additional BIB sources.

A7. The BIB sample preparation system of any of paragraphs A1-A5.2.2,wherein the first BIB source emits the first broad ion beam toward thesample along a first axis, the second BIB source emits the second broadion beam toward the sample along a second axis, and the angle betweenthe first source and the second source is between 60 degrees and 120degrees.

A8. The BIB sample preparation system of any of paragraphs A1-A7,wherein, further comprising: a processor; and a memory storing computerreadable instructions that, when executed on the processor, cause theprocessor to initiate the performance of the method of any of paragraphsB1-B7.2.1.

B1. A method for operating a broad ion beam (BIB) polisher havingimproved uptime, the method comprising: causing a first BIB source toemit a first broad ion beam towards a sample positioned within aninterior volume of the BIB polisher, wherein the first broad ion beamcauses a portion of the sample upon which it is incident to be removed;removing, while the first BIB source is in emitting the first broad ionbeam towards the sample, a second BIB source from the BIB polisher,wherein the second BIB source is configured to emit a second broad ionbeam towards the sample when the second BIB source is in use.

B2. The method of paragraph B1, further comprising reinstalling thesecond BIB source into the BIB polishing system.

B2.1. The method of paragraph B2, wherein the second BIB source isreinstalled while the first BIB source is emitting the first broad ionbeam.

B2.1.1. The method of paragraph B2.1, wherein the second BIB source isreinstalled while the first BIB source is emitting the first broad ionbeam towards the sample.

B2.1.2. The method of paragraph B2.1, wherein the second BIB source isreinstalled while the first BIB source is emitting the first broad ionbeam towards a different sample.

B3. The method of any of paragraphs B1-B2.1, further comprising causingthe second BIB source to emit the second broad ion beam.

B3.1. The method of paragraph B3, wherein the second broad ion beam isemitted towards the sample.

B3.2. The method of paragraph B3, wherein the second broad ion beam isemitted towards a different sample.

B4. The method of any of paragraphs B1-B3.2, further comprisinginstalling a third BIB source into the BIB polishing system.

B4.1. The method of paragraph B4, wherein the third BIB source isinstalled while the first BIB source is emitting the first broad ionbeam.

B4.1.1. The method of paragraph B4.1, wherein the third BIB source isinstalled while the first BIB source is emitting the first broad ionbeam towards the sample.

B4.1.2. The method of paragraph B4.1, wherein the third BIB source isinstalled while the first BIB source is emitting the first broad ionbeam towards a different sample.

B4.2. The method of any of paragraphs B4-B4.1.2, further comprising:causing the third BIB source to emit a third broad ion beam; andremoving, while the third BIB source is in emitting the third broad ionbeam, the first BIB source from the BIB polisher.

B5. The method of any of paragraphs B1-B4.2, further comprising: causingthe second BIB source to emit the second broad ion beam towards a newsample positioned within the interior volume of the BIB polisher,wherein the second broad ion beam causes a portion of the new sampleupon which it is incident to be removed; and removing, while the secondBIB source is in emitting the second broad ion beam towards the newsample, the first BIB source from the BIB polisher.

B6. The method of any of paragraphs B4.2-B5, further comprisingreinstalling the first BIB source into the BIB polishing system.

B6.1. The method of paragraph B6, wherein the first BIB source isreinstalled while the second BIB source is emitting the second broad ionbeam.

B6.1.1. The method of paragraph B6.1, wherein the first BIB source isreinstalled while the second BIB source is emitting the second broad ionbeam towards the sample.

B6.1.2. The method of paragraph B6.1, wherein the first BIB source isreinstalled while the second BIB source is emitting the second broad ionbeam towards a different sample.

B7. The method of any of paragraphs B1-B6.1.2, wherein the BIB polishercomprises a source housing that defines a housing volume and an aperturebetween the housing volume and the interior volume of the BIB polisher.

B7.1. The method of paragraph B7, wherein the second BIB source ispositioned within the housing volume.

B7.2. The method of any of paragraphs B7-B7.1, wherein the BIB polisherfurther comprises a valve configured to switch between: an open statewhere the ions emitted from the second BIB source are allowed to passthrough the aperture from the housing volume to interior volume; and asealed state where the valve prevents ions or emissions from the samplefrom passing from the interior volume to the housing volume.

B7.2.1. The method of paragraph B7.2, further comprising causing thevalve to switch to the sealed state before removing the second BIBsource from the BIB polisher.

C1. A method for preparing a sample with a combined broad ion beam (BIB)and laser sample preparation system, the method including the steps:positioning a sample within the interior volume of the combined samplepreparation system; causing a laser source component of the combinedsample preparation system to emit an optical beam towards the sample,wherein the optical beam causes a first portion of the sample upon whichit is incident to be removed; and causing a BIB source component of thecombined sample preparation system to emit a broad ion beam towards thesample, wherein the broad ion beam causes a second portion of the sampleupon which it is incident to be removed to reveal a region of interest.

C2. The method of paragraph C1, wherein the sample is irradiated by eachof the optical beam and the broad ion beam without removing the samplefrom the interior volume.

C2.1. The method of paragraph C2, wherein the sample is irradiated byeach of the optical beam and the broad ion beam without repositioningthe sample

C2.2. The method of any of paragraphs C2-C2.1, wherein the sample isirradiated by each of the optical beam and the broad ion beam withoutrepositioning the laser source

C2.3. The method of any of paragraphs C2-C2.2, wherein the sample isirradiated by each of the optical beam and the broad ion beam withoutrepositioning the BIB source.

C3. The method of any of paragraphs C1-C2.3, wherein the laser source ifconfigured to irradiate the sample with the optical beam for a firsttime period, and the BIB source is configured to irradiate the samplewith the optical beam for a first time period.

C3.1. The method of paragraph C2, wherein at least one of the first timeperiod and the second time period is a predetermined time period.

C3.2. The method of any of paragraphs C3-C3.1, wherein at least one ofthe first time period and the second time period is provided via a userinput.

C3.3. The method of any of paragraphs C3-C3.2, wherein at least one ofthe first time period and the second time period is determined byaccessing sample information associated with the sample

C3.4. The method of any of paragraphs C3-C3.3, wherein at least one ofthe first time period and the second time period is determined based ona material of the first portion of the sample

C3.5. The method of any of paragraphs C3-C3.4, wherein at least one ofthe first time period and the second time period is determined based onone or more sensors receiving information indicating that the firstportion of the sample has been removed

C3.6. The method of any of paragraphs C3-C3.5, wherein at least one ofthe first time period and the second time period is determined based onone or more sensors receiving information indicating that the secondportion of the sample has been removed.

C3.7. The method of any of paragraphs C3-C3.6, wherein at least one ofthe first time period and the second time period is determined based onone or more sensors receiving information indicating that the region ofinterest has been exposed.

C3.8. The method of any of paragraphs C3-C3.7, wherein at least one ofthe first time period and the second time period is determined based onone or more of a laser strength, a portion of the sample to be removedwith the laser, a BIB strength, a portion of the sample to be removedwith BIB, a surface of interest, or a combination thereof.

C4. The method of any of paragraphs C1-C3.8, wherein the method furthercomprises receiving sample information.

C4.1. The method of paragraph C4, wherein the sample information isreceived via user input.

C4.2. The method of paragraph C4, wherein the sample information isreceived by accessing a data file associated with the sample.

C4.3. The method of any of paragraphs C4-C4.2, wherein the sampleinformation includes one or more of a sample composition, a region ofinterest, and a surface of interest.

C4.4. The method of any of paragraphs C4-C4.3, wherein the sampleinformation includes one or more processing schedules.

C4.4.1. The method of paragraph C4.4, wherein the method furthercomprises determining one or more processing schedules based on thesample information.

C4.4.2. The method of paragraph C4.4, wherein the one or more processingschedules comprise one or more of a laser strength, a laser millingtime, a portion of the sample to be removed with the laser, a BIBstrength, a BIB milling time, a portion of the sample to be removed withBIB, a surface of interest, or a combination thereof.

C5. The method of any of paragraphs C1-C4.4.2, further comprising:positioning an additional sample within the interior volume of thecombined sample preparation system; causing the laser source componentof the combined sample preparation system to emit an additional opticalbeam towards the additional sample, wherein the additional optical beamcauses a first portion of the additional sample upon which it isincident to be removed; and causing the BIB source component of thecombined sample preparation system to emit an additional broad ion beamtowards the additional sample, wherein the additional broad ion beamcauses a second portion of the additional sample upon which it isincident to be removed to reveal an additional region of interest.

C6. The method of any of paragraphs C1-C5, wherein the optical beamremoves sample material 20×, 30×, 50×, or more rapidly than the broadion beam.

D1. A combined broad ion beam (BIB) and laser sample preparation systemhaving improved polishing throughput, the combined sample preparationsystem comprising: a housing defining an interior volume; a sample stagepositioned within the interior volume, wherein the sample stage isconfigured to hold a sample holder during polishing of a sample held bythe sample holder; a laser source configured to emit an optical beamtowards the sample when in use, wherein the optical beam causes a firstportion of the sample upon which it is incident to be removed; and a BIBsource configured to emit a broad ion beam towards the sample when inuse, wherein the broad ion beam causes a second portion of the sampleupon which it is incident to be removed to reveal a region of interest.

D2. The combined sample preparation system of paragraph D1, furthercomprising: a processor; and a memory storing computer readableinstructions that, when executed on the processor, cause the processorto initiate the performance of the method of any of paragraphs C1-C6.

E1. A storage cassette for storing multiple samples for broad ion beam(BIB) polishing, the storage cassette comprising: a housing at leastpartially defining an internal storage volume; a plurality of sampleholder housings located within the internal storage volume, wherein eachindividual sample holder housing is configured to receive a sampleholder that includes a corresponding sample for polishing in a BIBsystem; and wherein the storage cassette is configured to be insertedinto the BIB system, and each of the sample holder housings are furtherconfigured to allow its corresponding sample holder to be removed fromthe cassette when the cassette is inserted into the BIB system so thatthe corresponding sample can be polished by the BIB system.

F1. A broad ion beam (BIB) system for efficient processing of multiplesamples, the BIB system comprising: a housing defining an interiorvolume; a sample stage positioned within the interior volume, whereinthe sample stage is configured to hold a sample holder during polishingof a sample held by the sample holder; a BIB source configured to emit abroad ion beam towards the sample when in use, wherein the first BIBsource is positioned within a first source housing; a cassette housingconfigured to receive and hold a storage cassette of any of paragraphsE1-EXX; and a sample holder manipulator configured to: remove individualsample holders from the storage cassette; load the individual sampleholders onto the sample stage so that the corresponding sample can beprocessed; remove the individual sample holder from the sample stageafter the corresponding sample has been processed; and load theindividual sample holder back into the storage cassette.

F2. The BIB system of paragraph F1, further comprising: a processor; anda memory storing computer readable instructions that, when executed onthe processor, cause the processor to initiate the performance of themethod of any of paragraphs G1-G6.4.2.

G1. A method for efficiently processing multiple samples with a broadion beam (BIB) system, the method comprising the steps of: removing anindividual sample holder containing a sample from a storage cassette;loading the individual sample holders onto a sample stage configured tohold the sample holder during polishing of the corresponding sample heldby the individual sample holder; causing a BIB source to emit a broadion beam towards the sample, wherein the broad ion beam removes at leasta portion of the sample upon which it is incident; removing theindividual sample holder from the sample stage after the correspondingsample has been processed; and loading the individual sample holder backinto the storage cassette.

G1.1. The method of paragraph G1, further comprising receiving a storagecassette of paragraph E1 for processing in a BIB system.

G2. The method of any of paragraphs G1-G1.1, wherein the storagecassette stores a plurality of sample holders that each contain acorresponding sample

G2.1. The method of paragraph G2, further comprising: removing anotherindividual sample holder containing another sample from the storagecassette; loading the another individual sample holders onto the samplestage; causing the BIB source to emit another broad ion beam towards thesample, wherein the another broad ion beam removes at least a portion ofthe another sample upon which it is incident; removing the anotherindividual sample holder from the sample stage after the correspondinganother sample has been processed; and loading the another individualsample holder back into the storage cassette.

G2.2. The method of any of paragraphs G2-G2.1, further comprisingrepeating the method steps recited in paragraph G2.1 for one or moreadditional samples holders stored in the storage cassette.

G3. The method of any of paragraphs G2-G2.2, wherein the samples in thesample holders stored in the storage cassette are pre-aligned.

G3.1. The method of paragraph G2, wherein the samples are pre-aligned intheir respective sample holders using the method of any of paragraphsH1-H9.

G4. The method of any of paragraphs G1-G3.1, wherein the steps describedin any of paragraphs G1-G3.1 are at least partially automaticallyperformed by the BIB system.

G4.1. The method of paragraph G3.1, wherein the steps described in anyof paragraphs G1-G3.1 is performed without user input.

G5. The method of any of paragraphs G1-C4.1, wherein the BIB source isconfigured to irradiate the sample with the broad ion beam for a timeperiod.

G5.1. The method of paragraph G5, wherein the time period is apredetermined time period.

G5.2. The method of any of paragraphs G5-G5.1, wherein the time periodis provided via a user input.

G5.3. The method of any of paragraphs G5-G5.2, wherein the time periodis determined by accessing sample information associated with the sample

G5.4. The method of any of paragraphs G5-G5.3, wherein the time periodis determined based on a material of the portion of the sample

G5.5. The method of any of paragraphs G5-C3.4, wherein the time periodis determined based on one or more sensors receiving informationindicating that the portion of the sample has been removed

G5.7. The method of any of paragraphs G5-C3.6, wherein the time periodis determined based on one or more sensors receiving informationindicating that a region of interest has been exposed.

G5.8. The method of any of paragraphs G5-C3.7, wherein the time periodis determined based on one or more of a BIB strength, a portion of thesample to be removed with BIB, a surface of interest, or a combinationthereof.

G6. The method of any of paragraphs G1-G5.8, wherein the method furthercomprises receiving sample information.

G6.1. The method of paragraph G6, wherein the sample information isreceived via user input.

G6.2. The method of paragraph G6, wherein the sample information isreceived by accessing a data file associated with the correspondingsample.

G6.2.1. The method of paragraph G6.2, wherein the data file is stored ona memory component of the storage cassette.

G6.3. The method of any of paragraphs G6-G6.2, wherein the sampleinformation includes one or more of a sample composition, a region ofinterest, and a surface of interest.

G6.4. The method of any of paragraphs G6-G6.3, wherein the sampleinformation includes one or more processing schedules.

G6.4.1. The method of paragraph G6.4, wherein the method furthercomprises determining one or more processing schedules based on thesample information.

G6.4.2. The method of paragraph G6.4, wherein the one or more processingschedules comprise one or more of a BIB strength, a BIB milling time, aportion of the sample to be removed with BIB, a surface of interest, ora combination thereof.

H1. A method for pre-aligning samples for more efficient processing ofmultiple samples with a broad ion beam (BIB) system, the methodcomprising the steps of: affixing a sample to an adjustable portion of asample holder; nesting the sample holder with a first mask having afirst mask edge, wherein the first mask is positioned outside of a broadion beam (BIB) system; aligning the sample such that it has a desiredgeometric relationship to the first mask edge; and nesting the sampleholder with a second mask having a second mask edge, wherein the secondmask is positioned within a BIB system, and wherein the first mask andthe second mask are geometrically similar such that the geometricrelationship between the first mask edge and the sample when the sampleholder is nested with the first mask is the same as the geometricrelationship between the second mask edge and the sample when the sampleholder is nested with the second mask.

H2. The method of paragraph H1, wherein when the sample holder is nestedwith the second mask, the sample has the desired geometric relationshipwith the second edge without any alignment of the sample within the BIBsystem.

H3. The method of any of paragraphs H1-H2, further comprisingirradiating a portion of the second mask and a portion of the samplewith a broad ion beam to remove portions of the sample.

H3.1. The method of paragraph H3.1, wherein the second mask is made of ahard material that is not degraded by the broad ion beam.

H3.2. The method of any of paragraphs H3-H3.1, wherein the second maskblocks a portion of the broad ion beam such that a portion of interestof the sample is not removed from the sample.

H4. The method of any of paragraphs H1-H3.2, wherein aligningcorresponds to adjusting the adjustable portion of the sample holder sothat the sample is positioned such that it has a desired geometricrelationship to the first mask edge.

H5. The method of any of paragraphs H1-H4, wherein the first mask andthe second mask are geometrically identical.

H6. The method of any of paragraphs H1-H5, wherein the sample is affixedto the sample and aligned within a closed environment.

H6.1. The method of paragraph H6, wherein the closed environment has aninert gas atmosphere.

H6.2. The method of any of paragraphs H6-H6.1, wherein the closedenvironment has a reduced pressure

H6.3. The method of any of paragraphs H6-H6.2, wherein the closedenvironment has a vacuum pressure level.

H7. The method of any of paragraphs H1-H6.3, further comprisingtransferring the sample holder and the aligned sample from a preparationstation to a BIB system.

H7.1. The method of paragraph H7, wherein the BIB system is a BIB systemof any of A1-A8, D1-D2, and/or F1-F2.

H7.2. The method of any of paragraphs H7-H7.1, wherein the preparationstation is a closed environment of paragraphs H6-H6.3.

H7.3. The method of any of paragraphs H7-H7.2, wherein transferring thesample comprises loading the sample into a transfer device configured tointerface with both the sample preparation area and the BIB system.

H7.3.1. The method of paragraph H7.3, wherein the transfer device is asealed compartment for holding the sample holder such that it is sealedfrom the environment.

H7.3.1.1. The method of paragraph H7.3.1, the sealed compartment havingan inert gas.

H7.3.2. The method of any of paragraphs H7.3-H7.3.1.1, wherein thetransfer device is a storage cassette of paragraph E1.

H8. The method of any of paragraphs H1-H7.3.2, further comprisingrepeating the method for multiple samples on corresponding sampleholders.

H9. The method of any of paragraphs H1-H8, wherein further comprisesprocessing the sample using the methods of any of paragraphs C1-C6and/or G1-G6.4.2.

I1. Use of the systems of any of paragraphs A1-A8, D1-D2, E1, and/orF1-F2 to perform the method of any of paragraphs C1-C6, G1-G6.4.2,and/or H1-H9.

J1. Non-transitory computer readable media storing instructions that,when executed on a processor, cause the processor to initiate theperformance of the method of any of paragraphs C1-C6, G1-G6.4.2, and/orH1-H9.

What is claimed is:
 1. A broad ion beam (BIB) sample preparation systemhaving improved uptime, the BIB sample preparation system comprising: ahousing defining an interior volume; a sample stage positioned withinthe interior volume, wherein the sample stage is configured to hold asample holder during polishing of a sample held by the sample holder; afirst BIB source configured to emit a first broad ion beam towards thesample when in use, wherein the first BIB source is positioned within afirst source housing; and a second BIB source configured to emit asecond broad ion beam towards the sample when in use, wherein the secondBIB source is positioned within a second source housing, wherein thesecond BIB source is configured to be removed while the first BIB sourceis emitting the first broad ion beam toward the sample.
 2. The BIBsample preparation system of claim 1, wherein the second source isfurther configured to be reinstalled while the first BIB source isemitting the first broad ion beam toward the sample.
 3. The BIB samplepreparation system of claim 1, wherein the first source is configured tobe removed while the second source is emitting the second broad ion beamtoward the sample.
 4. The BIB sample preparation system of claim 1,wherein the first source housing at least partially defines: a firstvolume which includes the first BIB source; and a first aperture thatconnects the first volume with the interior volume.
 5. The BIB samplepreparation system of claim 4, further comprising a first valveconfigured to switch between: an open state where the ions emitted fromthe first BIB source are allowed to pass through the first aperture fromthe first volume to interior volume; and a sealed state where the firstvalve prevents ions or emissions from the sample from passing from theinterior volume to the first volume.
 6. The BIB sample preparationsystem of claim 5, wherein when the first valve is in the sealed state,the first volume may be opened to an external environment withoutaffecting the composition of gases within the interior volume.
 7. TheBIB sample preparation system of claim 5, wherein when the first valveis in the sealed state, the first BIB source can be at least one ofremoved and reinstalled from the BIB sample preparation system withoutaffecting the pressure or gas composition within the interior volume. 8.The BIB sample preparation system of claim 5, wherein the first housingfurther contains a pump system configured to bring at least one of thepressure and gaseous composition of the first volume to match that ofthe interior volume.
 9. The BIB sample preparation system of claim 1,further comprising a third BIB source configured to emit a third broadion beam towards the sample when in use, wherein the third BIB source ispositioned within a third source housing
 10. A method for operating abroad ion beam (BIB) polisher having improved uptime, the methodcomprising: causing a first BIB source to emit a first broad ion beamtowards a sample positioned within an interior volume of the BIBpolisher, wherein the first broad ion beam causes a portion of thesample upon which it is incident to be removed; removing, while thefirst BIB source is in emitting the first broad ion beam towards thesample, a second BIB source from the BIB polisher, wherein the secondBIB source is configured to emit a second broad ion beam towards thesample when the second BIB source is in use.
 11. The method of claim 10,further comprising reinstalling the second BIB source into the BIBpolishing system.
 12. The method of claim 11, wherein the second BIBsource is reinstalled while the first BIB source is emitting the firstbroad ion beam towards the sample.
 13. The method of claim 11, whereinthe second BIB source is reinstalled while the first BIB source isemitting the first broad ion beam towards a different sample.
 14. Themethod of claim 10, further comprising: causing the second BIB source toemit the second broad ion beam towards an additional sample positionedwithin the interior volume of the BIB polisher, wherein the second broadion beam causes a portion of the additional sample upon which it isincident to be removed; and removing, while the second BIB source is inemitting the second broad ion beam towards the sample, the first BIBsource from the BIB polisher.
 15. The method of claim 10, wherein theBIB polisher comprises a source housing that defines: a housing volume;and an aperture between the housing volume and the interior volume ofthe BIB polisher, wherein the second BIB source is positioned within thehousing volume.
 16. The method of claim 15, wherein the BIB polisherfurther comprises a valve configured to switch between: an open statewhere the ions emitted from the second BIB source are allowed to passthrough the aperture from the housing volume to interior volume; and asealed state where the valve prevents ions or emissions from the samplefrom passing from the interior volume to the housing volume.
 17. Themethod of claim 16, wherein the valve is in the sealed state, thehousing volume may be opened to an external environment withoutaffecting at least one of the pressure and the composition of gaseswithin the interior volume.
 18. The method of claim 16, furthercomprising causing the valve to switch to the sealed state beforeremoving the second BIB source from the BIB polisher.
 19. The method ofclaim 18, wherein the housing volume further contains a pump systemconfigured to bring at least one of the pressure and gaseous compositionof the housing volume to match that of the interior volume.
 20. Themethod of claim 19, further comprising: switching the valve to thesealed state before removing the second BIB source from the BIBpolisher; reinstalling the second BIB source in the housing volume;using the pump system to bring at least one of the pressure and gaseouscomposition of the housing volume to match that of the interior volume;and switching the valve to the open state.